Diffusion Furnaces Filter Monitoring
Activated Carbon Filter Monitoring in a Mini-Environment.
Activated carbon is a typical chemical filter used in semiconductor manufacturing facilities, due to the large surface area per unit mass within a carbon particle. Activated carbon filters target a wide range of contaminants such as organics, hydrocarbons, siloxanes, acidic species, etc, and chemical impregnants can be used to target other specific contaminants.
Implementing activated carbon filtration can have significant benefits in the reduction of SMC. An activated carbon chemical filter was installed in a mini-environment that previously had not implemented chemical filtration. A background level of contamination was established prior to installing the chemical filtration, and the contamination rate was ~1.1 ng/cm2/day. Upon installing the chemical filter, the mini-environment becomes significantly cleaner. In fact, mass is actually desorbed from the SiO2 surface as the mass on the surface equilibrates with the reduced contamination levels in the mini-environment. As equilibrium conditions are reached, mass accumulation rates on the sensor surface are near zero. The sensitivity and real-time feedback from the AiM give immediate confidence that the contamination levels have been minimized due to the installation of chemical filters and that the product is being exposed to a significantly cleaner environment.
The multipoint sampler allows the possibility to sample up to 16 points, due any sampling point has different level of importance the sequence and the alarms could be setted with high flexibility, and permit to understand the effect of malfunctioning of filters and reduce the defectivity.
ETG has developed this product for the semiconductor industries and is yet installed in this industries.
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Diffusion Furnaces Filter Monitoring.
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