ORION 3100 Trace Ammonia,HCl,HF,SO2 and speciate VOC's Gas Monitor for Semi Application
The Deep Ultraviolet (DUV) lithography process has proven to be especially sensitive to many types of molecular level
contaminates. Ammonia, and acid gases are known to create problems throughout the fab.
The development of improved DUV Resist materials and long-life filters has not lessened the need for continuous real-time monitors, in fact it has made the measurement of airborne contaminants critically important.
The use of the ORION 3100 based on CRDS Series Analyzer will improve resist uniformity, guarantee maximum filter life, and reduce process downtime.
ETG HMI (Human Machine Interface) software allows real-time viewing, manipulation, and automation of ammonia,
analyzer that are sampling from several different locations. This software program was written for semiconductor facilities attempting to monitor and control airborne contamination in the DUV lithography process. This software has the flexibility to be applied to any industrial setting where multipoint sampling by one or more CRDS analyzers is needed. Features include easy interactive control of alarms, data logging, historical trending, and basic analyzer functions from a Windows environment.
ORION 3100 System: Complete Airborne Contamination Monitoring
Real-time monitoring of airborne contamination has become critically important in semiconductor processing.
The industry requirements include rapid detection and alarm, very low level concentration monitoring, wide area sampling, and sensitivity to many different gases.
DUV lithographers are especially interested in monitoring ammonia, amines , NMP and acids. It has been found that these compounds cause problems when they react with chemically amplified photoresists.
Older but more traditional monitoring systems have been based on indirect methods of analysis.
These include impingers, ion chromatography, or chemiluminescence. These methods have generally been too slow, overly complex to operate, expensive or inaccurate.
ETG uses the proven technology of CRDS to address the airborne contamination monitoring problem in order to detect Ammonia, HF, HCl, the Pulsed Fluorescence fo SO2 and an enhanced GC-FID to detect speciate compounds of VOC’s.
ORION 3100 for ammonia trace detection combined with uVOC-CAM features the most powerful tools on the semi market for airborne molecular contamination in clean room.
Fast and reliable Detection
The data represents a measurement of atmospheric gas in a clean room using the ORION 3100. It can be assumed from the results that having people near the unit causes the ammonia concentration to fluctuate.
Enhanced Sensitivity
ORION 3100 features an effective light path length that extends up to several kilometers. The special features of the CRDS analyser perform a very enhanced sensitivity able to detect very low concentration of the contaminant
Fast time of response
The data it's updated every 5 seconds for each channel .
System Plug & Play
The system it's very simple to use and in few minutes he can to operate in clean room.
Low cost of ownership
The cost of ownership are very limited because the CRDS don't need of special consummables or critical parts
Any drift
The wavelength, temperature and pressure are precisely controlled and the time-based ring down measurement accurately determines the concentration
Main Features of ORION 3100
• Real-time at sub-ppb measurements
• CRDS principle of operations
• Continuous, unattended operation in harsh or hazardous environments
• No reagents, radioactive source, paper tape, absorbent tubes or other expensive consumables required for operation
• Long-term stability and reliability
• Solid-state electronics and no moving parts
• Low maintenance for maximum uptime
• Every monitor is shipped factory-calibrated with an applications performance specification.
• Stainless steel cleanroom compatible analyzers
Specifications
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